Thin Film Thickness Calculator

Film thickness from deposition rate and time, with optical properties.

Deposition Rate (nm/min)

Deposition Time (min)

Refractive Index (n)

Target Thickness (nm)

Tab to move between fields

Film Thickness (nm)

Time for Target (min)

100

Thickness (Å)600

Thickness (µm)0.06

Optical Path (nm)87.6

1st Order Color (nm)175.2

Atomic Layers200

Mass/Area (µg/cm²)13.2

Interference Wavelength287.6

How to Use This Calculator

Enter the deposition rate (nm/min) calibrated from a quartz crystal microbalance or profilometer measurement.
Set deposition time (min) and the film's refractive index (n) for optical path calculations.
Enter target thickness (nm) to calculate the required deposition time.
Review film thickness in nm, Å, and µm, plus optical path length (nm) for thin-film interference design.
Verify thickness after deposition with ellipsometry or profilometry to calibrate your deposition rate.

How the result changes with Deposition Rate (nm/min)

Deposition Rate (nm/min): Film growth rate. ALD: 0.1 nm/min, sputtering: 1-10 nm/min.
Deposition Time (min): Total deposition duration.
Refractive Index (n): Film refractive index. SiO2=1.46, TiO2=2.5, Si3N4=2.0.
Target Thickness (nm): Desired film thickness to calculate required time.

Identify Input Parameters
4 parameters
Deposition Rate (nm/min) = 1, Deposition Time (min) = 60, Refractive Index (n) = 1.46, Target Thickness (nm) = 100 = 4 input(s) provided
Calculate Film Thickness
Film Thickness = depositionRateNmPerMin * depositionTimeMin
60 = 60
Calculate Time for Target
Time for Target = targetThicknessNm / depositionRateNmPerMin
100 = 100
Calculate Thickness
Thickness = thickness * 10
600 = 600
Calculate Thickness
Thickness = thickness / 1000
0.06 = 0.06